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While ASML is still working hard to manufacture 2nm and 1nm EUV equipment, Zyvex has made a major breakthrough in the advanced process and announced that it has successfully built a lithography system for 0.7nm wafers.
EUV、ASML、nm、0.7nm、TSMC
Published Oct 03, 2022 Views: 639

Is TSMC in danger? This American company actually made a 0.7nm chip

While ASML is still working hard to manufacture 2nm and 1nm EUV equipment, Zyvex has made a major breakthrough in the advanced process and announced that it has successfully built a lithography system for 0.7nm wafers.

Is TSMC in danger?

While ASML is still working hard to manufacture 2nm and 1nm must-use EUV equipment, Zyvex has made a major breakthrough in advanced processes and announced that it has successfully built a lithography system for 0.7nm chips, which are mainly used for quantum computers, but The disadvantage of this technology is that the output is very low and cannot meet the large demand for chips in the market. It seems that it does not pose a threat to TSMC, and EUV's dominance is irreplaceable.

According to the official website of Zyvex Corporation of the United States, the newly launched ZyvexLitho1 lithography system, based on STM scanning tunneling microscope and using EBL electron beam lithography technology, successfully produced 768 picometers, that is, 0.7 nanometers, equivalent to 2 silicon atoms width, which is the current The most precise lithography system in the world.

At present, the chips produced by the ZyvexLitho1 system are mainly used in quantum computers, which can create highly precise solid-state quantum components, as well as nano-components and materials. Precision is very important for quantum computers.

Zyvex said it can already take orders from other customers, with the machines expected to ship in about six months.

Although the precision of EBL technology surpasses Esmol's EUV lithography equipment, the disadvantage is that the output is very low, which cannot meet the needs of large-scale wafer manufacturing, and is only suitable for small-scale production, so it is impossible to replace the existing EUV dominance.

The Dutch company Esmore exclusively supplies EUV lithography equipment necessary for the creation of advanced processes. Current customers include major semiconductor manufacturers such as TSMC, Intel and Samsung.

Nikkei previously reported that IMEC, dubbed the "brain behind the global semiconductor industry", said that with the cooperation of new technologies, Moore's Law will advance the advanced manufacturing process for generations.

IMEC mentioned that the 1-nanometer process needs to move forward for four generations. At present, its Roadmap has been scheduled and is expected to be realized in 2027, and the top 0.7-nanometer process is expected to be mass-produced after 2029.

From China Times

2022/10/03

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